Investigation of the shift of hot spot in lateral diffused LDMOS under ESD conditions

Qinsong Qian, Weifeng Sun, Jing Zhu, Longxing Shi. Investigation of the shift of hot spot in lateral diffused LDMOS under ESD conditions. In Microelectronics Reliability. pages 1935-1941, 2010. [doi]

@inproceedings{QianSZS10,
  title = {Investigation of the shift of hot spot in lateral diffused LDMOS under ESD conditions},
  author = {Qinsong Qian and Weifeng Sun and Jing Zhu and Longxing Shi},
  year = {2010},
  doi = {10.1016/j.microrel.2010.05.010},
  url = {http://dx.doi.org/10.1016/j.microrel.2010.05.010},
  researchr = {https://researchr.org/publication/QianSZS10},
  cites = {0},
  citedby = {0},
  pages = {1935-1941},
  booktitle = {Microelectronics Reliability},
}