Kha Gia Quach, Chi Nhan Duong, Khoa Luu, Tien D. Bui. Robust Deep Appearance Models. In 23rd International Conference on Pattern Recognition, ICPR 2016, Cancún, Mexico, December 4-8, 2016. pages 390-395, IEEE, 2016. [doi]
@inproceedings{QuachDLB16,
title = {Robust Deep Appearance Models},
author = {Kha Gia Quach and Chi Nhan Duong and Khoa Luu and Tien D. Bui},
year = {2016},
doi = {10.1109/ICPR.2016.7899665},
url = {http://dx.doi.org/10.1109/ICPR.2016.7899665},
researchr = {https://researchr.org/publication/QuachDLB16},
cites = {0},
citedby = {0},
pages = {390-395},
booktitle = {23rd International Conference on Pattern Recognition, ICPR 2016, Cancún, Mexico, December 4-8, 2016},
publisher = {IEEE},
isbn = {978-1-5090-4847-2},
}