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Robust Deep Appearance Models

Kha Gia Quach, Chi Nhan Duong, Khoa Luu, Tien D. Bui. Robust Deep Appearance Models. In 23rd International Conference on Pattern Recognition, ICPR 2016, Cancún, Mexico, December 4-8, 2016. pages 390-395, IEEE, 2016. [doi]

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