Modeling methodology: new approaches for simulation of wafer fabrication: the use of control variates and calibration metrics

Chanettre Rasmidatta, Shari Murray, John W. Fowler, Gerald T. Mackulak. Modeling methodology: new approaches for simulation of wafer fabrication: the use of control variates and calibration metrics. In Jane L. Snowdon, John M. Charnes, editors, Proceedings of the 34th Winter Simulation Conference: Exploring New Frontiers, San Diego, California, USA, December 8-11, 2002. pages 1414-1422, ACM, 2002. [doi]

@inproceedings{RasmidattaMFM02,
  title = {Modeling methodology: new approaches for simulation of wafer fabrication: the use of control variates and calibration metrics},
  author = {Chanettre Rasmidatta and Shari Murray and John W. Fowler and Gerald T. Mackulak},
  year = {2002},
  doi = {10.1145/1030453.1030658},
  url = {http://doi.acm.org/10.1145/1030453.1030658},
  tags = {modeling, systematic-approach},
  researchr = {https://researchr.org/publication/RasmidattaMFM02},
  cites = {0},
  citedby = {0},
  pages = {1414-1422},
  booktitle = {Proceedings of the 34th Winter Simulation Conference: Exploring New Frontiers, San Diego, California, USA, December 8-11, 2002},
  editor = {Jane L. Snowdon and John M. Charnes},
  publisher = {ACM},
  isbn = {0-7803-7615-3},
}