Modeling methodology: new approaches for simulation of wafer fabrication: the use of control variates and calibration metrics

Chanettre Rasmidatta, Shari Murray, John W. Fowler, Gerald T. Mackulak. Modeling methodology: new approaches for simulation of wafer fabrication: the use of control variates and calibration metrics. In Jane L. Snowdon, John M. Charnes, editors, Proceedings of the 34th Winter Simulation Conference: Exploring New Frontiers, San Diego, California, USA, December 8-11, 2002. pages 1414-1422, ACM, 2002. [doi]

Abstract

Abstract is missing.