Raven Reisch, Tobias Hauser, Benjamin Lutz, Matteo Pantano, Tobias Kamps, Alois Knoll. Distance-Based Multivariate Anomaly Detection in Wire Arc Additive Manufacturing. In M. Arif Wani, Feng Luo 0001, Xiaolin Andy Li, Dejing Dou, Francesco Bonchi, editors, 19th IEEE International Conference on Machine Learning and Applications, ICMLA 2020, Miami, FL, USA, December 14-17, 2020. pages 659-664, IEEE, 2020. [doi]
Abstract is missing.