Simulation and evolutionary optimization of electron-beam lithography with genetic and simplex-downhill algorithms

F. Robin, A. Orzati, E. Moreno, Otte Jakob Homan, W. Bachtold. Simulation and evolutionary optimization of electron-beam lithography with genetic and simplex-downhill algorithms. IEEE Trans. Evolutionary Computation, 7(1):69-82, 2003.

@article{RobinOMHB03,
  title = {Simulation and evolutionary optimization of electron-beam lithography with genetic and simplex-downhill algorithms},
  author = {F. Robin and A. Orzati and E. Moreno and Otte Jakob Homan and W. Bachtold},
  year = {2003},
  tags = {optimization},
  researchr = {https://researchr.org/publication/RobinOMHB03},
  cites = {0},
  citedby = {0},
  journal = {IEEE Trans. Evolutionary Computation},
  volume = {7},
  number = {1},
  pages = {69-82},
}