Simulation and evolutionary optimization of electron-beam lithography with genetic and simplex-downhill algorithms

F. Robin, A. Orzati, E. Moreno, Otte Jakob Homan, W. Bachtold. Simulation and evolutionary optimization of electron-beam lithography with genetic and simplex-downhill algorithms. IEEE Trans. Evolutionary Computation, 7(1):69-82, 2003.

Abstract

Abstract is missing.