Optical Lithography Simulation with Focus Variation using Wavelet Transform

Rance Rodrigues, Sandip Kundu. Optical Lithography Simulation with Focus Variation using Wavelet Transform. In VLSI Design 2010: 23rd International Conference on VLSI Design, 9th International Conference on Embedded Systems, Bangalore, India, 3-7 January 2010. pages 387-392, IEEE, 2010. [doi]

@inproceedings{RodriguesK10,
  title = {Optical Lithography Simulation with Focus Variation using Wavelet Transform},
  author = {Rance Rodrigues and Sandip Kundu},
  year = {2010},
  doi = {10.1109/VLSI.Design.2010.67},
  url = {http://doi.ieeecomputersociety.org/10.1109/VLSI.Design.2010.67},
  researchr = {https://researchr.org/publication/RodriguesK10},
  cites = {0},
  citedby = {0},
  pages = {387-392},
  booktitle = {VLSI Design 2010: 23rd International Conference on VLSI Design, 9th International Conference on Embedded Systems, Bangalore, India, 3-7 January 2010},
  publisher = {IEEE},
  isbn = {978-0-7695-3928-7},
}