3D thermal modeling of a plasma assisted chemical vapor deposition process - researchr publication authors

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S. Rouquette, Laurent Autrique, C. Chaussavoine, L. Thomas. 3D thermal modeling of a plasma assisted chemical vapor deposition process. In American Control Conference, ACC 2002, Anchorage, Alaska, USA, May 8-10 2002. pages 3813-3816, IEEE, 2002. [doi]

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