S. Rouquette, Laurent Autrique, C. Chaussavoine, L. Thomas. 3D thermal modeling of a plasma assisted chemical vapor deposition process. In American Control Conference, ACC 2002, Anchorage, Alaska, USA, May 8-10 2002. pages 3813-3816, IEEE, 2002. [doi]
@inproceedings{RouquetteACT02,
title = {3D thermal modeling of a plasma assisted chemical vapor deposition process},
author = {S. Rouquette and Laurent Autrique and C. Chaussavoine and L. Thomas},
year = {2002},
doi = {10.1109/ACC.2002.1024522},
url = {http://dx.doi.org/10.1109/ACC.2002.1024522},
researchr = {https://researchr.org/publication/RouquetteACT02},
cites = {0},
citedby = {0},
pages = {3813-3816},
booktitle = {American Control Conference, ACC 2002, Anchorage, Alaska, USA, May 8-10 2002},
publisher = {IEEE},
isbn = {0-7803-7298-0},
}