Reliability of 100 nm silicon nitride capacitors in an InP HEMT MMIC process

William J. Rowe, Bruce M. Paine, Adele E. Schmitz, Robert H. Walden, Michael J. Delaney. Reliability of 100 nm silicon nitride capacitors in an InP HEMT MMIC process. Microelectronics Reliability, 43(6):845-851, 2003. [doi]

Abstract

Abstract is missing.