A design platform for 90-nm leakage reduction techniques

Philippe Royannez, Hugh Mair, Franck Dahan, Mike Wagner, Mark Streeter, Laurent Bouetel, Joel Blasquez, H. Clasen, G. Semino, Julie Dong, D. Scott, B. Pitts, Claudine Raibaut, Uming Ko. A design platform for 90-nm leakage reduction techniques. In William H. Joyner Jr., Grant Martin, Andrew B. Kahng, editors, Proceedings of the 42nd Design Automation Conference, DAC 2005, San Diego, CA, USA, June 13-17, 2005. pages 549-550, ACM, 2005. [doi]

@inproceedings{RoyannezMDWSBBCSDSPRK05,
  title = {A design platform for 90-nm leakage reduction techniques},
  author = {Philippe Royannez and Hugh Mair and Franck Dahan and Mike Wagner and Mark Streeter and Laurent Bouetel and Joel Blasquez and H. Clasen and G. Semino and Julie Dong and D. Scott and B. Pitts and Claudine Raibaut and Uming Ko},
  year = {2005},
  doi = {10.1145/1065579.1065722},
  url = {http://doi.acm.org/10.1145/1065579.1065722},
  tags = {design},
  researchr = {https://researchr.org/publication/RoyannezMDWSBBCSDSPRK05},
  cites = {0},
  citedby = {0},
  pages = {549-550},
  booktitle = {Proceedings of the 42nd Design Automation Conference, DAC 2005, San Diego, CA, USA, June 13-17, 2005},
  editor = {William H. Joyner Jr. and Grant Martin and Andrew B. Kahng},
  publisher = {ACM},
  isbn = {1-59593-058-2},
}