Modeling of a plasma processing machine for semiconductor wafer etching using energy-functions-based neural networks

Fathi M. A. Salam, Christian Piwek, Gamze Erten, Timothy A. Grotjohn, Jes Asmussen. Modeling of a plasma processing machine for semiconductor wafer etching using energy-functions-based neural networks. IEEE Trans. Contr. Sys. Techn., 5(6):598-613, 1997. [doi]

Abstract

Abstract is missing.