Researchr is a web site for finding, collecting, sharing, and reviewing scientific publications, for researchers by researchers.
Sign up for an account to create a profile with publication list, tag and review your related work, and share bibliographies with your co-authors.
Toshiyuki Sameshima, Tomokazu Nagao, Erika Sekiguchi, Masahiko Hasumi. Argon Precursor Ion Implantation Used to Activate Boron Atoms in Silicon at Low Temperatures. IEEE Access, 8:72598-72606, 2020. [doi]
Abstract is missing.