A 300mm CMOS-Compatible PECVD Silicon Nitride Platform for Integrated Photonics with Low Loss and Low Process Induced Phase Variation

Sandeep S. Saseendran, Tangla D. Kongnyuy, Bruno Figeys, Federico Buja, Benedetto Troia, Sarp Kerman, Aleksandrs Marinins, Roelof Jansen, Xavier Rottenberg, Deniz Sabuncuoglu Tezcan, Philippe Soussan. A 300mm CMOS-Compatible PECVD Silicon Nitride Platform for Integrated Photonics with Low Loss and Low Process Induced Phase Variation. In Optical Fiber Communications Conference and Exhibition, OFC 2019, San Diego, CA, USA, March 3-7, 2019. pages 1-3, IEEE, 2019. [doi]

@inproceedings{SaseendranKFBTK19,
  title = {A 300mm CMOS-Compatible PECVD Silicon Nitride Platform for Integrated Photonics with Low Loss and Low Process Induced Phase Variation},
  author = {Sandeep S. Saseendran and Tangla D. Kongnyuy and Bruno Figeys and Federico Buja and Benedetto Troia and Sarp Kerman and Aleksandrs Marinins and Roelof Jansen and Xavier Rottenberg and Deniz Sabuncuoglu Tezcan and Philippe Soussan},
  year = {2019},
  url = {http://ieeexplore.ieee.org/document/8696834},
  researchr = {https://researchr.org/publication/SaseendranKFBTK19},
  cites = {0},
  citedby = {0},
  pages = {1-3},
  booktitle = {Optical Fiber Communications Conference and Exhibition, OFC 2019, San Diego, CA, USA, March 3-7, 2019},
  publisher = {IEEE},
  isbn = {978-1-943580-53-8},
}