A 300mm CMOS-Compatible PECVD Silicon Nitride Platform for Integrated Photonics with Low Loss and Low Process Induced Phase Variation

Sandeep S. Saseendran, Tangla D. Kongnyuy, Bruno Figeys, Federico Buja, Benedetto Troia, Sarp Kerman, Aleksandrs Marinins, Roelof Jansen, Xavier Rottenberg, Deniz Sabuncuoglu Tezcan, Philippe Soussan. A 300mm CMOS-Compatible PECVD Silicon Nitride Platform for Integrated Photonics with Low Loss and Low Process Induced Phase Variation. In Optical Fiber Communications Conference and Exhibition, OFC 2019, San Diego, CA, USA, March 3-7, 2019. pages 1-3, IEEE, 2019. [doi]

Abstract

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