Dispersion, High-Frequency and Power Characteristics of AlN/GaN Metal Insulator Semiconductor Field Effect Transistors with in-situ MOCVD Deposited Si::3::N::4::

Sanghyun Seo, Eunjung Cho, Giorgi Aroshvili, Chong Jin, Dimitris Pavlidis, Laurence Considine. Dispersion, High-Frequency and Power Characteristics of AlN/GaN Metal Insulator Semiconductor Field Effect Transistors with in-situ MOCVD Deposited Si::3::N::4::. IEICE Transactions, 93-C(8):1245-1250, 2010. [doi]

@article{SeoCAJPC10,
  title = {Dispersion, High-Frequency and Power Characteristics of AlN/GaN Metal Insulator Semiconductor Field Effect Transistors with in-situ MOCVD Deposited Si::3::N::4::},
  author = {Sanghyun Seo and Eunjung Cho and Giorgi Aroshvili and Chong Jin and Dimitris Pavlidis and Laurence Considine},
  year = {2010},
  url = {http://search.ieice.org/bin/summary.php?id=e93-c_8_1245},
  researchr = {https://researchr.org/publication/SeoCAJPC10},
  cites = {0},
  citedby = {0},
  journal = {IEICE Transactions},
  volume = {93-C},
  number = {8},
  pages = {1245-1250},
}