A process-scalable RF transmitter using 90nm and 65nm Si CMOS - researchr publication authors

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Atsushi Shirane, Hiroyuki Ito, Noboru Ishihara, Kazuya Masu. A process-scalable RF transmitter using 90nm and 65nm Si CMOS. In 2013 International Symposium on VLSI Design, Automation, and Test, VLSI-DAT 2013, Hsinchu, Taiwan, April 22-24, 2013. pages 1-4, IEEE, 2013. [doi]

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