A Load Balancing Method for Dedicated Photolithography Machine Constraint

Arthur M. D. Shr, Alan Liu, Peter P. Chen. A Load Balancing Method for Dedicated Photolithography Machine Constraint. In Weiming Shen, editor, Information Technology For Balanced Manufacturing Systems - IFIP TC5, WG 5.5 Seventh International Conference on Information Technology for Balanced Automation Systems in Manufacturing and Services, Niagara Falls, Ontario, Canada, September 4-6, 2006. Volume 220 of IFIP, pages 339-348, Springer, 2006. [doi]

Abstract

Abstract is missing.