Statistical Yield Modeling for Sub-wavelength Lithography

Aswin Sreedhar, Sandip Kundu. Statistical Yield Modeling for Sub-wavelength Lithography. In Douglas Young, Nur A. Touba, editors, 2008 IEEE International Test Conference, ITC 2008, Santa Clara, California, USA, October 26-31, 2008. pages 1-8, IEEE, 2008. [doi]

Authors

Aswin Sreedhar

This author has not been identified. Look up 'Aswin Sreedhar' in Google

Sandip Kundu

This author has not been identified. Look up 'Sandip Kundu' in Google