The negative bias temperature instability in MOS devices: A review

James H. Stathis, S. Zafar. The negative bias temperature instability in MOS devices: A review. Microelectronics Reliability, 46(2-4):270-286, 2006. [doi]

@article{StathisZ06,
  title = {The negative bias temperature instability in MOS devices: A review},
  author = {James H. Stathis and S. Zafar},
  year = {2006},
  doi = {10.1016/j.microrel.2005.08.001},
  url = {http://dx.doi.org/10.1016/j.microrel.2005.08.001},
  tags = {reviewing},
  researchr = {https://researchr.org/publication/StathisZ06},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {46},
  number = {2-4},
  pages = {270-286},
}