Aaron Stillmaker, Bevan M. Baas. Scaling equations for the accurate prediction of CMOS device performance from 180 nm to 7 nm. Integration, 58:74-81, 2017. [doi]
@article{StillmakerB17,
title = {Scaling equations for the accurate prediction of CMOS device performance from 180 nm to 7 nm},
author = {Aaron Stillmaker and Bevan M. Baas},
year = {2017},
doi = {10.1016/j.vlsi.2017.02.002},
url = {https://doi.org/10.1016/j.vlsi.2017.02.002},
researchr = {https://researchr.org/publication/StillmakerB17},
cites = {0},
citedby = {0},
journal = {Integration},
volume = {58},
pages = {74-81},
}