Creating an affordable 22nm node using design-lithography co-optimization - researchr publication authors

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Andrzej J. Strojwas, T. Jhaveri, V. Rovner, Lawrence T. Pileggi. Creating an affordable 22nm node using design-lithography co-optimization. In Proceedings of the 46th Design Automation Conference, DAC 2009, San Francisco, CA, USA, July 26-31, 2009. pages 95-96, ACM, 2009. [doi]

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