Polyvinyl-alcohol-based color resist for low-temperature color-filter production

Hikaru Sugita, Satoshi Ebata, Hiroyuki Suzuki, Satoshi Kura, Eiji Yoneda, Kyousuke Yoda, Hiroshi Mashima, Satoshi Fukuma, Daiki Kanai, Tetsuya Yamamura, Yuuji Manabe, Kazuko Tateshima, Yoshikazu Ito. Polyvinyl-alcohol-based color resist for low-temperature color-filter production. Displays, 77:102393, April 2023. [doi]

Abstract

Abstract is missing.