A 0.11 mum CMOS technology featuring copper and very low k interconnects with high performance and reliability

Yoshihiro Takao, Hiroshi Kudo, Junichi Mitani, Yoshiyuki Kotani, Satoshi Yamaguchi, Keizaburo Yoshie, Kazuo Sukegawa, Nobuhisa Naori, Satoru Asai, Michiari Kawano. A 0.11 mum CMOS technology featuring copper and very low k interconnects with high performance and reliability. Microelectronics Reliability, 42(1):15-25, 2002. [doi]

Abstract

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