Cu-Al intermetallic compound investigation using ex-situ post annealing and in-situ annealing

Y. Y. Tan, Q. L. Yang, K. S. Sim, Li Tao Sun, Xing Wu. Cu-Al intermetallic compound investigation using ex-situ post annealing and in-situ annealing. Microelectronics Reliability, 55(11):2316-2323, 2015. [doi]

@article{TanYSSW15,
  title = {Cu-Al intermetallic compound investigation using ex-situ post annealing and in-situ annealing},
  author = {Y. Y. Tan and Q. L. Yang and K. S. Sim and Li Tao Sun and Xing Wu},
  year = {2015},
  doi = {10.1016/j.microrel.2015.06.050},
  url = {http://dx.doi.org/10.1016/j.microrel.2015.06.050},
  researchr = {https://researchr.org/publication/TanYSSW15},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {55},
  number = {11},
  pages = {2316-2323},
}