Design for manufacturing layout analyses correlate layout to physico-chemical yield loss mechanisms

Christine P. Tan, Congshu Zhou, Yi Tian, Chang Liu, Hein-Mun Lam, Jian Zhang, Mark Lu. Design for manufacturing layout analyses correlate layout to physico-chemical yield loss mechanisms. In Proceedings of the IEEE 2013 Custom Integrated Circuits Conference, San Jose, CA, USA, September 22-25, 2013. pages 1-4, IEEE, 2013. [doi]

Abstract

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