Pitch Device Design in 10nm-Class DRAM Process through DTCO - researchr publication authors

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Yanzhe Tang, Zhongming Liu, Weibing Shang, Fengqin Zhang, Bernard Wu, Zhong Kong, Hongwen Li, Hong Ma, Kanyu Cao. Pitch Device Design in 10nm-Class DRAM Process through DTCO. In Fan Ye, Ting-Ao Tang, editors, 14th IEEE International Conference on ASIC, ASICON 2021, Kunming, China, October 26-29, 2021. pages 1-4, IEEE, 2021. [doi]

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