Mode-Evolution-based InP/InGaAsP Polarization Rotator with Etching-Stop Layer

Ryota Tanomura, Abdulaziz E. Elfiqi, Dawei Yu, Warakorn Yanwachirakul, Haifeng Shao, Yuto Suzuki, Takuo Tanemura, Yoshiaki Nakano. Mode-Evolution-based InP/InGaAsP Polarization Rotator with Etching-Stop Layer. In Optical Fiber Communications Conference and Exhibition, OFC 2021, San Francisco, CA, USA, June 6-10, 2021. pages 1-3, IEEE, 2021. [doi]

Abstract

Abstract is missing.