Control of photoresist film thickness: Iterative feedback tuning approach

Arthur Tay, Weng Khuen Ho, Jiewen Deng, Boon Keng Lok. Control of photoresist film thickness: Iterative feedback tuning approach. Computers & Chemical Engineering, 30(3):572-579, 2006. [doi]

@article{TayHDL06,
  title = {Control of photoresist film thickness: Iterative feedback tuning approach},
  author = {Arthur Tay and Weng Khuen Ho and Jiewen Deng and Boon Keng Lok},
  year = {2006},
  doi = {10.1016/j.compchemeng.2005.10.004},
  url = {http://dx.doi.org/10.1016/j.compchemeng.2005.10.004},
  tags = {systematic-approach},
  researchr = {https://researchr.org/publication/TayHDL06},
  cites = {0},
  citedby = {0},
  journal = {Computers & Chemical Engineering},
  volume = {30},
  number = {3},
  pages = {572-579},
}