In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer in Lithography

Arthur Tay, Weng Khuen Ho, Xiaodong Wu, Xiaoqi Chen. In Situ Monitoring of Photoresist Thickness Uniformity of a Rotating Wafer in Lithography. IEEE T. Instrumentation and Measurement, 58(12):3978-3984, 2009. [doi]

Abstract

Abstract is missing.