A. Teramoto, H. Umeda, K. Azamawari, K. Kobayashi, K. Shiga, J. Komori, Y. Ohno, A. Shigetomi. Time-dependent dielectric breakdown of SiO::2:: films in a wide electric field range. Microelectronics Reliability, 41(1):47-52, 2001. [doi]
@article{TeramotoUAKSKOS01,
title = {Time-dependent dielectric breakdown of SiO::2:: films in a wide electric field range},
author = {A. Teramoto and H. Umeda and K. Azamawari and K. Kobayashi and K. Shiga and J. Komori and Y. Ohno and A. Shigetomi},
year = {2001},
doi = {10.1016/S0026-2714(00)00095-0},
url = {http://dx.doi.org/10.1016/S0026-2714(00)00095-0},
researchr = {https://researchr.org/publication/TeramotoUAKSKOS01},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {41},
number = {1},
pages = {47-52},
}