A. Teramoto, H. Umeda, K. Azamawari, K. Kobayashi, K. Shiga, J. Komori, Y. Ohno, A. Shigetomi. Time-dependent dielectric breakdown of SiO::2:: films in a wide electric field range. Microelectronics Reliability, 41(1):47-52, 2001. [doi]
Abstract is missing.