Impact of front-back gate coupling on low frequency noise in 28 nm FDSOI MOSFETs

Christoforos Theodorou, Eleftherios G. Ioannidis, Sébastien Haendler, Nicolas Planes, Franck Arnaud, Jalal Jomaah, Charalambos A. Dimitriadis, Gérard Ghibaudo. Impact of front-back gate coupling on low frequency noise in 28 nm FDSOI MOSFETs. In Proceedings of the 2012 European Solid-State Device Research Conference, ESSDERC 2012, Bordeaux, France, September 17-21, 2012. pages 334-337, IEEE, 2012. [doi]

Abstract

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