Interface Roughness Effects in Ultra-Thin Tunneling Oxides

D. Z.-Y. Ting, Erik S. Daniel, T. C. Mcgill. Interface Roughness Effects in Ultra-Thin Tunneling Oxides. VLSI Design, 1998(1):47-51, 1998. [doi]

Authors

D. Z.-Y. Ting

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Erik S. Daniel

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T. C. Mcgill

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