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Characterization of Trench MOS Gate Structures Utilizing Photon Emission Microscopy

Masanori Usui, Takahide Sugiyama, Masayasu Ishiko, Jun Morimoto, Hirokazu Saitoh, Masaki Ajioka. Characterization of Trench MOS Gate Structures Utilizing Photon Emission Microscopy. Microelectronics Reliability, 42(9-11):1647-1652, 2002. [doi]

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