Characteristics optimization of N::2::O annealing on tungsten nanocrystal with W/Si dual-sputtered method for nonvolatile memory application

Jer-Chyi Wang, Pai-Chi Chou, Chao Sung Lai, Wen-Hui Lee, Chi-Fong Ai. Characteristics optimization of N::2::O annealing on tungsten nanocrystal with W/Si dual-sputtered method for nonvolatile memory application. Microelectronics Reliability, 50(5):639-642, 2010. [doi]

@article{WangCLLA10,
  title = {Characteristics optimization of N::2::O annealing on tungsten nanocrystal with W/Si dual-sputtered method for nonvolatile memory application},
  author = {Jer-Chyi Wang and Pai-Chi Chou and Chao Sung Lai and Wen-Hui Lee and Chi-Fong Ai},
  year = {2010},
  doi = {10.1016/j.microrel.2010.01.027},
  url = {http://dx.doi.org/10.1016/j.microrel.2010.01.027},
  tags = {optimization},
  researchr = {https://researchr.org/publication/WangCLLA10},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {50},
  number = {5},
  pages = {639-642},
}