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Bilayer wire-grid polarizers for DUV to IR fabricated using EUV interference and nanoimprint lithography

Li Wang, H. Schift, P. M. Kristiansen, K. Jefimovs, H. H. Solak, J. Gobrecht, Y. Ekinci. Bilayer wire-grid polarizers for DUV to IR fabricated using EUV interference and nanoimprint lithography. In 8th IEEE International Conference on Nano/Micro Engineered and Molecular Systems, NEMS 2013, Suzhou, China, April 7-10, 2013. pages 1232-1235, IEEE, 2013. [doi]

Authors

Li Wang

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H. Schift

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P. M. Kristiansen

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K. Jefimovs

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H. H. Solak

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J. Gobrecht

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Y. Ekinci

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