X. Y. Wang, H. Zhang, X. P. Ma, Q. Cheng, C. G. Li, M.-X. Li, T. N. Chen, P. Zhang, J. Q. Shao. Degradation behavior and mechanism of polymer films for high-ohmic resistor protection in a heat and humid environment. Microelectronics Reliability, 57:79-85, 2016. [doi]
@article{WangZMCLLCZS16,
title = {Degradation behavior and mechanism of polymer films for high-ohmic resistor protection in a heat and humid environment},
author = {X. Y. Wang and H. Zhang and X. P. Ma and Q. Cheng and C. G. Li and M.-X. Li and T. N. Chen and P. Zhang and J. Q. Shao},
year = {2016},
doi = {10.1016/j.microrel.2015.12.005},
url = {http://dx.doi.org/10.1016/j.microrel.2015.12.005},
researchr = {https://researchr.org/publication/WangZMCLLCZS16},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {57},
pages = {79-85},
}