Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review - researchr publication authors

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Changtao Wang, Wei Zhang, Zeyu Zhao, Yanqin Wang, Ping Gao, Yunfei Luo, Xiangang Luo. Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review. Micromachines, 7(7):118, 2016. [doi]

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