Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review

Changtao Wang, Wei Zhang, Zeyu Zhao, Yanqin Wang, Ping Gao, Yunfei Luo, Xiangang Luo. Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review. Micromachines, 7(7):118, 2016. [doi]

@article{WangZZWGLL16,
  title = {Plasmonic Structures, Materials and Lenses for Optical Lithography beyond the Diffraction Limit: A Review},
  author = {Changtao Wang and Wei Zhang and Zeyu Zhao and Yanqin Wang and Ping Gao and Yunfei Luo and Xiangang Luo},
  year = {2016},
  doi = {10.3390/mi7070118},
  url = {http://dx.doi.org/10.3390/mi7070118},
  researchr = {https://researchr.org/publication/WangZZWGLL16},
  cites = {0},
  citedby = {0},
  journal = {Micromachines},
  volume = {7},
  number = {7},
  pages = {118},
}