Hei Wong, V. A. Gritsenko. Defects in silicon oxynitride gate dielectric films. Microelectronics Reliability, 42(4-5):597-605, 2002. [doi]
@article{WongG02,
title = {Defects in silicon oxynitride gate dielectric films},
author = {Hei Wong and V. A. Gritsenko},
year = {2002},
doi = {10.1016/S0026-2714(02)00005-7},
url = {http://dx.doi.org/10.1016/S0026-2714(02)00005-7},
researchr = {https://researchr.org/publication/WongG02},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {42},
number = {4-5},
pages = {597-605},
}