Thermal and voltage instabilities of hafnium oxide films prepared by sputtering technique

Hei Wong, B. L. Yang, Shurong Dong. Thermal and voltage instabilities of hafnium oxide films prepared by sputtering technique. Microelectronics Reliability, 53(12):1863-1867, 2013. [doi]

Authors

Hei Wong

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B. L. Yang

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Shurong Dong

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