Hei Wong, B. L. Yang, Shurong Dong. Thermal and voltage instabilities of hafnium oxide films prepared by sputtering technique. Microelectronics Reliability, 53(12):1863-1867, 2013. [doi]
@article{WongYD13,
title = {Thermal and voltage instabilities of hafnium oxide films prepared by sputtering technique},
author = {Hei Wong and B. L. Yang and Shurong Dong},
year = {2013},
doi = {10.1016/j.microrel.2013.06.006},
url = {http://dx.doi.org/10.1016/j.microrel.2013.06.006},
researchr = {https://researchr.org/publication/WongYD13},
cites = {0},
citedby = {0},
journal = {Microelectronics Reliability},
volume = {53},
number = {12},
pages = {1863-1867},
}