Yiwen Wu, Yuyang Chen, Ye Xia, Yao Zhao, Jingya Wang 0001, Xuming He 0001, Hao Geng, Jingyi Yu 0001. TokMan: Tokenize Manhattan Mask Optimization for Inverse Lithography. In Danielle Belgrave, Cheng Zhang 0005, Laura N. Montoya, Hsuan-Tien Lin, Razvan Pascanu, Piotr Koniusz, Marzyeh Ghassemi, Nancy Chen, Iván Vladimir Meza Ruíz, Arturo Loaiza-Bonilla, editors, Advances in Neural Information Processing Systems 38: Annual Conference on Neural Information Processing Systems 2025, NeurIPS 2025, San Diago, CA, USA, December 2-7, 2025 / Mexico City, Mexico, November 30 - December 5, 2025. 2025. [doi]
Abstract is missing.