Control design for a 6 DOF e-beam lithography stage

Pai-Hsueh Yang, Brian Alamo, Gerry B. Andeen. Control design for a 6 DOF e-beam lithography stage. In American Control Conference, ACC 2001, Arlington, VA, USA, 25-27 June, 2001. pages 2255-2260, IEEE, 2001. [doi]

Abstract

Abstract is missing.