XRD Patterns and Bismuth Sticking Coefficient in Thin Films Fabricated by Ion Beam Sputtering Method

Seung-Ho Yang, Yong-Pil Park. XRD Patterns and Bismuth Sticking Coefficient in Thin Films Fabricated by Ion Beam Sputtering Method. J. Inform. and Commun. Convergence Engineering, 4(4):158-161, 2006. [doi]

@article{YangP06-2,
  title = {XRD Patterns and Bismuth Sticking Coefficient in Thin Films Fabricated by Ion Beam Sputtering Method},
  author = {Seung-Ho Yang and Yong-Pil Park},
  year = {2006},
  url = {http://www.koreascience.or.kr/article/ArticleFullRecord.jsp?cn=E1ICAW_2006_v4n4_158},
  researchr = {https://researchr.org/publication/YangP06-2},
  cites = {0},
  citedby = {0},
  journal = {J. Inform. and Commun. Convergence Engineering},
  volume = {4},
  number = {4},
  pages = {158-161},
}