Transient analysis of the impact stage of wirebonding on Cu/low-K wafers

Chang-Lin Yeh, Yi-Shao Lai. Transient analysis of the impact stage of wirebonding on Cu/low-K wafers. Microelectronics Reliability, 45(2):371-378, 2005. [doi]

@article{YehL05-0,
  title = {Transient analysis of the impact stage of wirebonding on Cu/low-K wafers},
  author = {Chang-Lin Yeh and Yi-Shao Lai},
  year = {2005},
  doi = {10.1016/j.microrel.2004.04.026},
  url = {http://dx.doi.org/10.1016/j.microrel.2004.04.026},
  tags = {analysis},
  researchr = {https://researchr.org/publication/YehL05-0},
  cites = {0},
  citedby = {0},
  journal = {Microelectronics Reliability},
  volume = {45},
  number = {2},
  pages = {371-378},
}