A novel intensity based optical proximity correction algorithm with speedup in lithography simulation - researchr publication authors

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Peng Yu, David Z. Pan. A novel intensity based optical proximity correction algorithm with speedup in lithography simulation. In Georges G. E. Gielen, editor, 2007 International Conference on Computer-Aided Design (ICCAD 07), November 5-8, 2007, San Jose, CA, USA. pages 854-859, IEEE, 2007. [doi]

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